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SLVU28 Datasheet(PDF) 5 Page - Semtech Corporation |
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SLVU28 Datasheet(HTML) 5 Page - Semtech Corporation |
5 / 8 page 5 ã 2000 Semtech Corp. www.semtech.com PROTECTION PRODUCTS PROTECTION PRODUCTS SLVU2.8 Applications Information (continued) ,PP ,6% ,37 ,5 95:0 9 9 37 9& 9%55 ,%55 6% EPD TVS VI Characteristic Curve EPD TVS Characteristics The SLVU2.8 is constructed using Semtechs propri- etary EPD technology. The structure of the EPD TVS is vastly different from the traditional pn-junction devices. At voltages below 5V, high leakage current and junction capacitance render conventional avalanche technology impractical for most applications. However, by utilizing the EPD technology, the SLVU2.8 can effectively operate at 2.8V while maintaining excellent electrical characteristics. The EPD TVS employs a complex nppn structure in contrast to the pn structure normally found in tradi- tional silicon-avalanche TVS diodes. The EPD mecha- nism is achieved by engineering the center region of the device such that the reverse biased junction does not avalanche, but will punch-through to a conduct- ing state. This structure results in a device with supe- rior dc electrical parameters at low voltages while maintaining the capability to absorb high transient currents. The IV characteristic curve of the EPD device is shown in Figure 1. The device represents a high impedance to the circuit up to the working voltage (V RWM). During a transient event, the device will begin to conduct as it is biased in the reverse direction. When the punch- through voltage (V PT) is exceeded, the device enters a low impedance state, diverting the transient current away from the protected circuit. When the device is conducting current, it will exhibit a slight snap-back or negative resistance characteristic due to its structure. This must be considered when connecting the device to a power supply rail. To return to a non-conducting state, the current through the device must fall below the snap-back current (approximately < 50mA). |
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